Extreme Ultraviolet Lithography: Principles and Basic Technologies - Hiroo Kinoshita
-35% koodilla BOOKS
Toimitus 12-18 arkipäivässä
30 päivän palautusoikeus
This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of l ... Täydellinen kuvaus
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Kuvaus
This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node.
Lisätietoja
| Kirjoittaja | Hiroo Kinoshita |
|---|---|
| Julkaisija | LAP Lambert Academic Publishing |
| Julkaisuvuosi | 2016 |
| Kannen tyyppi | Pehmeäkantinen |
| EAN | 9783659827402 |