Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Tien-Chien Jen,Sina Karimzadeh,Oluwatobi Adeleke
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Toimitus 17-23 arkipäivässä
30 päivän palautusoikeus
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
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Kuvaus
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Lisätietoja
| Kirjoittaja | Tien-Chien Jen, Sina Karimzadeh, Oluwatobi Adeleke |
|---|---|
| Julkaisija | CRC Press |
| Julkaisuvuosi | 2023 |
| Kannen tyyppi | Kovakantinen |
| EAN | 9781032386706 |